SemiVi

Process Simulator

Process Simulator

The process simulator performs physics-based simulation of semiconductor fabrication processes.

Salient Features
  • Simulates etching, deposition, implantation, and annealing steps on the 2D and 3D structures.,
  • Silicon oxidation during annealing, due to oxidative gas, is simulated.
  • Implant tables used for modeling implantation.
  • Three-stream model used for dopant diffusion. Simpler and faster models are also provided.
  • Python interface for convenient scripting of the process-flow and structure generation.
  • Pseudo-process mode enables running fast 2D and 3D process simulations by performing pure geometric operations.
  • A graphic-user-interface is provided for convenient creation of the structure and the process-flow.

Pseudo-process Mode

  • Pseudo-process mode enables running fast 2D and 3D process simulations by performing pure geometric operations.
  • Highly useful in iterative process-flow development.
  • Easy use: Just enable pseudo-process mode in the initialization.
  • Add the process steps exactly as before.
  • Save the structure after each process step.
  • Visualize the structure using a STEP viewer.

Process Generator - A user-friendly GUI for

  • Generate initial structure
  • Add process steps and define masks
  • Design process flow using pseudo-process simulation
  • Visualize and edit pseudo-process flow on-the-go
  • Perform full process simulations OR
  • Export python script for full process simulations
  • Process Generator - GUI

Python Interface

  • Python-interface enables scripting and parametrization of the process flow generation task.
  • An example code (without all the functions) looks as follows:

    import prosolver as pr 
    dioPro = pr.Process (...)
    ...
    dioPro.setRegion (...)
    ...
    dioPro.createDeviceMesh ()
    dioPro.deposit (...) #dep oxide
    dioPro.mask (...) #set mask
    dioPro.etch (...) #masked etch
    dioPro.implant (...) #masked implant
    dioPro.etch (...) #strip etch
    dioPro.anneal (...) #anneal wafer

  • For detailed description, please refer to the user-guide and the examples therein.

Structure from GDS Layouts

  • GDS Layout import can generate regions by sweeping masks vertically
  • Can also create doping distribution using GDS mask.

User-manual and examples

  • A detailed user-manual describing physic behind semulated process step
  • Process simulator GUI
  • Settings in a config file and their use

License Purchase

  • Please send an email to info@semivi.ch.